Atomic Layer Deposition of Metal Phosphates

Since the introduction of lithium iron phosphate (LFP) as an electrode material for Li-ion batteries (LIB’s), metal phosphates in general have become increasingly important. The strong covalency P-O bonds typically results a very good thermal and structural stability, which is one main reasons success LFP LIB electrode. However, applications these are multi-fold. Apart from LIB’s, they been proven to be promising towards e.g. electrocatalytic water splitting, biocompatible coatings or even protective luminescent materials. With mind, research deposition materials also becomes Atomic Layer Deposition (ALD) has emerged technique with unique nanotailoring capabilities compared conventional methods, particularly owing its high thickness compositional control. Down-scaling micro-electronic devices according Moore’s law already increased interest ALD can offer. addition using fabrication such devices, it offer way create model systems gain fundamental insight broad range applications. From this seen why combination both fields, i.e. phosphates, gaining lot over past years. first deposited 1969, big challenge find suitable precursor. Today, most popular choice proves trimethyl phosphate, TMP. It allowed variety (e.g. aluminium etc.), but more required further extent field. To stimulate research, comprehensive study on currently (un)available literature needed. would allow get better understanding effect different precursors and/or various reaction mechanisms during understood, well potential (such ion battery applications). As was so far not yet available, we hope that work view scientific help guide future thin film researchers.